The role of plasma-surface interactions in process chemistry : mechanistic studies of a carbon nitride deposition and sulfur fluoride/oxygen etching of silicon

submitted by Joshua M, Stillahn
Bok · Språk ikke angitt · 2011 Joshua M. Stillahn

Utgitt	Fort Collins : Colorado State University , c2011
Omfang	219 s. : ill.
Opplysninger	Fotografisk opptrykk fra University Microfilms International, Ann Arbor, Mich.. - Avhandling (dr. philos.) - Colorado State University, 2010