Nonequilibrium diffusion of dopants in silicon : numerical solutions of the diffusion equation, application to redistribution of ion implanted dopants in <111> recrystallized silicon
by Rasit Turan
Bok Engelsk 1990 Raṣit Turan
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| Utgitt | [Oslo] , 1990
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| Omfang | 22 bl. : ill.
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