Microlithography : Science and Technology, Second Edition
Kazuaki. Suzuki
Bok Engelsk 2010 · Electronic books.
| Annen tittel | |
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| Utgitt | Hoboken : : Taylor and Francis, , 2010.
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| Omfang | 1 online resource (866 p.)
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| Utgave | 2nd ed.
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| Opplysninger | Description based upon print version of record.. - Front cover; Preface; Editors; Contributors; Contents; Part I: Exposure System; Chapter 1. System Overview of Optical Steppers and Scanners; Chapter 2. Optical Lithography Modeling; Chapter 3. Optics for Photolithography; Chapter 4. Excimer Lasers for Advanced Microlithography; Chapter 5. Alignment and Overlay; Chapter 6. Electron Beam Lithogrpahy Systems; Chapter 7. X-ray Lithography; Chapter 8. EUV Lithography; Chapter 9. Imprint Lithography; Part II: Resists and Processing; Chapter 10. Chemistry of Photoresist Materials; Chapter 11. Resist Processing. - Chapter 12. Multilayer Resist TechnologyChapter 13. Dry Etching of Photoresists; Part III: Metrology and Nanolithography; Chapter 14. Critical-Dimensional Metrology for Integrated-Circuit Technology; Chapter 15. Electron Beam Nanolithography; Index; Back cover. - This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts.New in the Second EditionIn addition to updated information on existing material, this new edition features coverage of technologies developed ov
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| Emner | |
| Sjanger | |
| Dewey | |
| ISBN | 0824790243. - 9780824790240
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