Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland
· Chris A. Mack, Tom Stevenson, chairs/editors ; sponsored by EOS - European Optical Society, SPIE - the International Society for Optical Engineering, Commission of the European Communities, Directorate General for Science, Research, and Development ; cosponsored by Scottish Enterprise, Sira Technology Centre (UK) ; cooperating organization: IEE - the Institution of Electrical Engineers (UK)
Bok Engelsk 1999