Photomask and next-generation lithography mask technology IX : 23-25 April 2002, Yokohama, Japan
· Hiroichi Kawihara, editor ; sponsored by PMJ - Photomask Japan, BACUS - the international technical group of SPIE, dedicated to the advancement of photomask technology, SPIE - the International Society for Optical Engineering ; cooperating organizations for symposium: the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit: SEMI Japan - Semiconductor Equipment and Materials International ; supported by Yokohama City
Bok Engelsk 2002