Lithography for semiconductor manufacturing II : 30 May-1 June 2001, Edinburgh, UK
· Chris A. Mack, Tom Stevenson, chairs/editors ; sponsored and published by SPIE - the International Society for Optical Engineering ; cosponsored by Scottish Enterprise ; cooperating organizations: EOS - European Optical Society, IEE - the Institution of Electrical Engineers (UK)
Bok Engelsk 2001