Photomask and next-generation lithography mask technology VII : 12-13 April 2000, Yokohama, Japan
· Hiroaki Morimoto, editor ; sponsored by Photomask Japan, BACUS, SPIE - the International Society for Optical Engineering ; cooperating organizations for symposium: Japan Society of Applied Physics, Japan Society for Precision Engineering, Institute of Electrical Engineers of Japan ; cooperating organization for technical exhibit: SEMI Japan ; supported by Yokohama City
Bok Engelsk 2000